In a press release yesterday the Demarr corporation announced a new advance in armour technology based upon ‘nano flaw rectification technology’. This new approach to manufacturing allows highly sensitive nanites to identify flaws in the armour’s structure normally only visible under an electron microscope. These nanites are then able to rectify any accessible flaws atom by atom.
Such a breakthrough has long been sought by many in the defence business as the logical next step in improved quality control and manufacturing techniques. Demarr’s success in this endeavour speaks well to the extensive investments they have recently made in R&D. While this approach is still limited, armour layers must be kept very thin to allow the nanites access, it is hoped that this will help to improve yields and reduce costs through lower wastage.
Demarr stock price rose 7% in the wake of the announcement.